FIELD: chemistry.
SUBSTANCE: invention can be used for manufacturing materials, containing film structures with novel electrical, magnetic and optic characteristics, in particular, for obtaining implants, possessing electrets properties. Method of forming coating of tantalum pentoxide on substrate includes formation of coating from precursor - fluoride tantalum compound, with coating being formed by method of plasma-electrolytic processing of substrate by pulse current in fluorotantalate electrolyte on conducting metal substrate from titanium or its alloy in voltage range from 50 to 300 V in potentiostatic mode.
EFFECT: simplification of method of applying coating of tantalum pentoxide, realisation of the process does not require complex special equipment and expensive reagents.
2 cl, 7 ex
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