FIELD: physics.
SUBSTANCE: invention relates to ion-beam cleaning of the surface of articles made of dielectric material or conducting material with dielectric inclusions. The method comprises placing articles on a conducting holder, generating plasma with pulse-periodic acceleration of ions thereof by passing a plasma stream through an acceleration gap and successively irradiating the surface of the articles with a stream of accelerated ions and the plasma while applying high-frequency short-pulse bias potential on the conducting the conducting holder. The pulse duration is equal to 0.1-10 mcm, the pulse duty factor is equal to 50-99% and the amplitude of the potential is equal to 1-10 kV. Irradiation of the surface of the articles is carried out with pulse duration of the bias potential which is shorter than the charging time of the capacitor formed by the conducting holder and the emission plasma boundary, and with duration of the interval between pulses of the accelerating voltage which is shorter than the time taken by the plasma stream to pass through the acceleration gap.
EFFECT: high efficiency of short-pulse high-frequency ion-treatment of materials.
8 cl, 6 dwg, 2 ex
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Authors
Dates
2014-08-27—Published
2012-11-23—Filed