STRUCTURES COMPRISING MOLECULAR STRUCTURES WITH HIGH ASPECT RATIO, AND METHODS OF THEIR MANUFACTURING Russian patent published in 2014 - IPC B82B3/00 C01B31/00 

FIELD: nanotechnology.

SUBSTANCE: invention relates to the filming technology and relates to structures comprising molecular structures with a high aspect ratio (HARM structures) and method of their manufacturing. The nanocarbon film structure comprising HARM structures, where the structure comprises a substantially planar network of randomly oriented HARM structures and the substrate in contact with the network. The substrate has an opening, at that in the peripheral area of the said opening the network is in contact with the substrate so that the middle part of the network is not fixed on the substrate. The method comprises the stages of manufacturing the flat network of HARM structures on the prepared substrate near or in contact with the substrate having an opening, by applying the HARM structures on the prepared substrate and the opening of the substrate, and removal of the prepared substrate from the network.

EFFECT: invention provides creation of the new types of structures comprising HARM structures.

9 cl, 12 dwg, 2 ex