FIELD: process engineering.
SUBSTANCE: invention relates to production of selective gas membranes operating owing to selective diffusion of hydrogen gas atoms through thin metal film (of palladium or alloys based thereon) which are used in device for deep cleaning of hydrogen from associated impurities, hydrogen separation from hydrogen-bearing gas mixed and in micro reactors. Proposed method comprises the magnetron sputtering of target of composition approximating to Pd-40% Cu, in atmosphere of Ar 10-1 Pa on thermally oxidised polished plates of monocrystalline silicon and separation of obtained foil from substrate. Note here that substrate temperature makes 300-700 K. Separated thin foil is additionally heated in vacuum not worse than 10-4 Pa at the rate of 100 K/h to 970 K and cooled at the rate of 100-200 K/h to the room temperature.
EFFECT: high-efficiency membranes for deep cleaning of hydrogen that feature high selective water permeability and efficiency.
1 dwg, 1 ex
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Authors
Dates
2014-12-20—Published
2013-10-24—Filed