FIELD: chemistry.
SUBSTANCE: in the method of forming high current-carrying capacity YBa2Cu3O7-x films on a gold buffer underlayer, a gold contact pad is formed on a dielectric substrate before depositing YBa2Cu3O7-x films on the dielectric substrate. Targets made of gold and ceramic YBa2Cu3O7 are sputtered using a laser with radiation wavelength of 1.06 mcm, pulse duration of 10-20 ns, pulse repetition frequency of 10 Hz and laser radiation power density of (5-7)·108 W/cm2. The method comprises preheating the gold target and substrate to temperature T=450-500°C, establishing pressure of 0.1-0.5 Pa, sputtering the gold target onto the substrate through a screen, placed 0.3-0.5 mm from the substrate, heating the YBa2Cu3O7 target to T=600-700°C, heating the substrate to 800-840°C, establishing pressure of 50-100 Pa and sputtering the YBa2Cu3O7 target onto the formed contact pads to thickness of 50-200 nm to form films with critical temperature of the superconducting junction Ts=88-89 K, width of the superconducting junction ΔTs= 2-3 K and critical current density Jc>105 A/cm2.
EFFECT: obtaining superconducting films with high current-carrying capacity on a gold buffer underlayer, which provide high density of critical supercurrent density.
6 dwg
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Authors
Dates
2015-01-10—Published
2013-05-06—Filed