DIFFRACTION PERIODIC MICROSTRUCTURE BASED ON POROUS SILICON Russian patent published in 2016 - IPC G02B5/18 B82B1/00 H01L21/265 

Abstract RU 2597801 C1

FIELD: chemistry.

SUBSTANCE: invention relates to diffraction periodic microstructures for visible range, based on porous silicon. In diffraction periodic microstructure based on porous silicon, comprising a substrate, made of monocrystalline silicon with a diffraction periodic microstructure, formed diffraction periodic microstructure based on porous silicon comprises ion-synthesised metal-containing nanoparticles, dispersed in surface region of substrate at layer thickness from 10 to 200 nm with metal concentration of 2.5·1020-6.5·1023 atoms/cm3.

EFFECT: technical effect consists in creation of a diffraction periodic microstructure based on porous silicon with different metal-containing nanoparticles.

1 cl, 20 dwg

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RU 2 597 801 C1

Authors

Stepanov Andrej Lvovich

Nuzhdin Vladimir Ivanovich

Valeev Valerij Ferdinandovich

Osin Yurij Nikolaevich

Dates

2016-09-20Published

2015-03-25Filed