COMPOSITION FOR ELECTROLYTIC METAL DEPOSITION WITH LEVELLER Russian patent published in 2015 - IPC C08G73/02 C08L79/02 C25D3/02 C25D3/32 C25D3/38 C25D3/58 H05K3/42 

FIELD: metallurgy.

SUBSTANCE: invention refers to composition for electrolytic metal deposition, application of polyalkanolamine or its derivatives, and method of metal layer deposition. Composition for electrolytic metal deposition includes metal ion source and at least one leveller. Copper ions are used as metal ions. Leveller is polyalkanolamine or its derivatives obtained by alkoxylation, substitution, or alkoxylation and substitution of polyalkanolamine. Polyalkanolamine is obtained by condensation of at least one trialkanolamine of a general formula N(R¹-OH)₃ (la) and/or at least one dialkanolamine of a general formula R²-N(R¹-OH)₂ (lb), where R¹ radical is selected separately out of bivalent linear or bifurcated aliphatic hydrocarbon radical with 2 to 6 carbon atoms, R² radical is selected out of hydrogen, linear or bifurcated aliphatic, cycloaliphatic and aromatic hydrocarbon radicals with 1 to 30 carbon atoms. Polyalkanolamine or its derivatives are used in solution for electrolytic metal deposition. Method of metal layer deposition on a substrate involves application of solution for electrolytic metal deposition, containing the composition described above, on a substrate in advance. Then current of definite density is connected to the substrate for time period sufficient for metal layer deposition.

EFFECT: obtainment of leveller with good levelling properties, obtainment of flat metal layer with level surface by flaw-free filling with nano-sized and micro-sized elements.

15 cl, 6 dwg, 1 tbl, 17 ex