FIELD: electricity.
SUBSTANCE: method includes generation of boron ion plasma in pulse high-current magnetron discharge, which parameters are sufficient to implement sputtering of boron target and are as follows: current of 10-50A, voltage of 1-2kV, pulse duration of 10-100 mcs. Initiation of pulse high-current magnetron discharge is made by ignition of permanent low-current magnetron discharge with current up to 50mA, voltage up to 2kV and heating by this discharge of the solid boron target heat-insulated with conductive material up to temperature of 400-500°C, when sharp increase of specific conductivity of boron takes place up to values sufficient for stable burning of pulse high-current magnetron discharge.
EFFECT: increased content of boron ions in plasma.
2 cl, 2 dwg
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