MAGNETRON SPRAY SYSTEM WITH ELECTRON INJECTION Russian patent published in 2017 - IPC C23C14/35 H01J37/34 H01J37/36 

FIELD: physics.

SUBSTANCE: device contains a cathode node in the anode body (1), which includes a flat target-cathode (2). In the cathode node behind the target-cathode plane (2), which is electrically connected to the electrode (3), there is a magnet system (4) with a magnetic circuit (5). The electron injector (6) is located in the cathode node. Electrons are injected into the cathode layer of the magnetron discharge through the hole in the target-cathode (2). As a result, a significant additional energy corresponding to the cathodic drop in the potential is obtained, and effective ionization of the working gas occurs near the surface of the sputtered target under conditions of reduced pressure, when an independent form of combustion of the magnetron discharge is difficult or even impossible.

EFFECT: reducing the working gas pressure in the drift space of the atomized atom flow between the target and the substrate.

3 cl, 2 dwg