DEPOSITION BY IMPULSE MAGNETRON DISPERSION WITH PRE-IONISATION Russian patent published in 2009 - IPC C23C14/35 C23C14/02 C23C14/54 

FIELD: physics.

SUBSTANCE: invention is related to method for deposition of substance onto substrate, impulse source of supply for magnetron reactor and to magnetron reactor. Substance is dispersed onto substrate in magnetron reactor. Prior to supply of each pulse of the main voltage, gas is pre-ionised to provide for generation of current pulses. Time for decay of specified current pulses after cutoff of the main voltage pulses that are less than 5 microseconds. Pulse source of supply comprises facilities for generation of the main voltage pulses, facilities for generation of control pulses and commuting facilities.

EFFECT: efficient ionisation of dispersed vapors of substance is achieved.

17 cl, 18 dwg, 1 tbl