METHOD AND SYSTEM FOR ELECTRON BEAM APPLICATIONS Russian patent published in 2015 - IPC A61N5/10 

Abstract RU 2552383 C2

FIELD: physics.

SUBSTANCE: present invention relates to electron beam systems. The disclosed electron beam application system comprises a source of one electron beam for generating an electron beam using a linear accelerator, wherein the electron beam source and the linear accelerator are arranged such that the generated electron beam exits the linear accelerator substantially collinear to the direction of movement of electrons in the accelerator, an applicator configured to correctly define one or more of the shape, size and flatness of the generated electron beam, and a moderator mounted on the path of the generated electron beam. If the moderator is mounted on the path, the generated electron beam exits the system with a lower energy level than when the moderator is not mounted on the path. The moderator includes at least one element an atomic number higher than 4.

EFFECT: enabling use at a medical centre with very little radiation shielding, in conjunction with low-z moderators which reduce the energy level of the electron beam without the need for complex or expensive energy control systems, and enabling treatment of patients in an unshielded room.

28 cl, 6 dwg

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RU 2 552 383 C2

Authors

Gouer Donal'D A.

Krechetov Aleksandr S.

Dates

2015-06-10Published

2010-07-12Filed