ALLOYING GRAPHENE WITH HOLES Russian patent published in 2015 - IPC H01L29/76 H01L21/22 B82B1/00 

Abstract RU 2565336 C2

FIELD: nanotechnology.

SUBSTANCE: invention relates to the technology of nanoelectronic devices based on graphene. The electronic device based on graphene comprises a graphene layer having a first work function and a metal oxide film located on the graphene layer, and the metal oxide film has a second work function exceeding than the first work function. The electrons are transferred from the graphene layer to the metal oxide film, forming a layer of accumulation of holes in the graphene layer.

EFFECT: invention eliminates damage of the graphene lattice and the appearance of defects that impair the operational characteristics of the device.

33 cl, 16 dwg

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RU 2 565 336 C2

Authors

Chen Wei

Chen Zhenyu

Wee Thye Shen Andrew

Xie Lanfei

Wang Xiao

Sun Jiatao

Ariando

Dates

2015-10-20Published

2011-05-05Filed