METHOD OF FORMING POLYMER TEMPLATES OF NANOSTRUCTURES OF DIFFERENT GEOMETRY Russian patent published in 2016 - IPC G03F7/00 B82B3/00 

FIELD: nanotechnology.

SUBSTANCE: method of forming polymer templates of nanostructures of different geometry comprises forming a digital template of nanostructures, transfer of this template to the surface of positive resist deposited on a substrate, the resist development, the substrate, together with the semiconductors, are used as metal-plated substrates, at that the templates in the form of nanoscale rings are formed with single-point exposure of the positive resist by an electron beam with a diameter of 2 nm and a dose in the range of 0.2 pC to 100 pC per the point, and the templates of nanostructures of complex shape and high resolution are formed by sequential point exposure of the positive resist at a pitch of 5 to 30 nm with increase of the average speed of exposure to 10 times.

EFFECT: provision of opportunity of obtaining the polymer nanostructures of different geometry, having sharp outlines of faces at sub-20 nm resolution at various semiconductor and metallic substrates.

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