FIELD: physics.
SUBSTANCE: invention relates to plasma engineering, namely, to devices for plasma-enhanced deposition of films and can be used for making thin-film solar cells, photosensitive materials for optical sensors and thin-film transistors for large-size displays, for application of protective coatings. For application of functional layers of thin-film solar cells use is made of a gas-discharge device based on a low-frequency induction discharge of a transformer type. Device comprises separated by gas gates two and more reaction chambers with a movable ribbon-like substrate and discharge chambers with magnetic circuits made so that in every reaction chamber there burn four and more plasma turns of low-frequency induction discharge of a transformer type, encompassing the ribbon-like substrate, generating ions and radicals in immediate vicinity to the treated surface of the substrate, and mutually affecting each other, lead to alignment of spatial distribution of ions and radicals density and, correspondingly, to deposition of homogeneous films.
EFFECT: ensuring of a possibility to deposit homogeneous functional layers of thin-film solar cells of large size.
2 cl, 3 dwg
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Authors
Dates
2016-04-20—Published
2014-09-04—Filed