PLASMA REACTOR WITH MAGNETIC SYSTEM Russian patent published in 2013 - IPC H05H1/10 

FIELD: electricity.

SUBSTANCE: plasma reactor with a magnetic system differs by the fact that electrodes of capacitance excitation are made in the form of two hollow cylinders arranged inside the chamber coaxially, the antenna of the induction excitation is arranged radially symmetrically relative to hollow cylinders and the substrate, the magnetic system is made of solenoidal elements arranged coaxially to the substrate, and the upper plane of the substrate is between two lower solenoidal elements of the magnetic system.

EFFECT: increased speed and evenness of treatment of substrates from different materials, during treatment of semiconductor substrates surface defects are minimised on surface and in volume of semiconductor structures.

6 cl, 3 dwg