GAS JET METHOD FOR DEPOSITION OF DIAMOND FILMS WITH ACTIVATION IN MICROWAVE DISCHARGE PLASMA Russian patent published in 2023 - IPC C23C14/00 C01B32/25 

FIELD: protective coatings.

SUBSTANCE: invention can be used to produce diamond coatings. Hydrogen 1 and carbon-containing gas 2 are fed into the discharge chamber 14. The resulting mixture is activated using a microwave discharge to form a plasma cloud 3. The discharge chamber 14 and the deposition chamber 5 are separated from each other, but communicate with each other through a conical nozzle 4. The activated gas mixture is passed through the conical nozzle 4 into the deposition chamber 5, where with the help of a supersonic jet 8 of an activated mixture of gases, the process of deposition and formation of diamond crystals on the surface of a water-cooled substrate 6 is carried out. Molten Rose alloy metal is first applied to the surface of the substrate holder, and then the substrate 6 is installed. Before deposition, the surface of the substrate 6 is cleaned and treated with atomic hydrogen without removing the substrate into the atmosphere. Hydrogen 1 is fed directly into the discharge chamber 14, and carbon-containing gas is fed into a separate channel 2 at the entrance to the conical nozzle 4.

EFFECT: high deposition rate is ensured and the quality of diamond films is improved.

2 cl, 1 dwg