FIELD: plasma technology.
SUBSTANCE: invention relates to plasma technology, namely to inductively coupled plasma sources. In the method for ion-plasma treatment of large-scale substrates, a molecular gas or a mixture of molecular gases with an inert gas is injected directly into the working chamber while the inert gas is injected into the working chamber through U-shaped gas discharge tubes, while additional activation of the working plasma-forming gas in the central part of the working chamber is carried out by using ferromagnetically enhanced induction discharges.
EFFECT: increase in the efficiency and a reduction in heat losses of the gas–discharge device.
1 cl, 1 dwg
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