SOURCE OF INTENSE ION BEAMS BASED ON ECR DISCHARGE PLASMA, HELD IN OPEN MAGNETIC TRAP Russian patent published in 2020 - IPC H01J27/16 H01J27/18 H01J37/08 

Abstract RU 2726143 C1

FIELD: physics.

SUBSTANCE: invention relates to formation of intense high-brightness ion beams by extraction thereof from a dense ECR discharge plasma generated in an open magnetic trap by high-power millimeter wavelength radiation. Device comprises a plasma electrode made in the form of a funnel, the wide part of which faces the magnetic trap, and the narrow part is directed to the accelerating electrode, wherein the funnel axis coincides with the axis of the system. This enables to extract and form densely divergent ion beams from a much denser plasma, which is impossible when using flat and conical "quasi-pierce" electrodes. Developed ion source makes it possible to form from a dense plasma the ion beams with a record emittance normalized brightness at level of 1.5 kA/(π·mm·mrad)2.

EFFECT: reduced effect of space charge of ion beam on transverse spreading of beam and increased density of plasma flow, which makes it possible to form beam with minimum divergence angle.

4 cl, 2 dwg

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RU 2 726 143 C1

Authors

Vybin Sergej Sergeevich

Izotov Ivan Vladimirovich

Sidorov Aleksandr Vasilevich

Skalyga Vadim Aleksandrovich

Dates

2020-07-09Published

2019-12-26Filed