FIELD: technological processes.
SUBSTANCE: method of micro instrument blade point forming includes producing of initial plane-parallel crystal plate with working surface orientation in crystallographic plane (100) and thickness, equal to blade final thickness, application of protective layer on both surfaces of plate, etching openings in protective layer in direction of plane (111) working surface output line for blade formation on plate working surface, through silicon anisotropic etching from plate working side to form blade in protective coating openings and protective coating removal. Silicon anisotropic etching is carried out in two stages, wherein first stage is performed until plate thinning to thickness, equal to difference between blade final thickness and thickness of blade section with more blunt angle of sharpening, and prior to second stage protective coating is completely removed from plate working side, leaving it on reverse side and etching passes until moment of protective coating appearance, applied on plate reverse side. At that, initial plate thickness is selected by enclosed formula.
EFFECT: enabling elimination of plate breakage during formation of blades, formation of best sharpening angle on orientation of 100 or 110 and elimination of blades point break.
1 cl, 1 tbl, 4 dwg
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Authors
Dates
2016-11-20—Published
2015-07-22—Filed