DEVICE FOR APPLICATION OF METAL FILM AND METHOD OF APPLICATION OF METAL FILM Russian patent published in 2017 - IPC C25D5/02 C25D3/00 

Abstract RU 2615009 C1

FIELD: metal industry.

SUBSTANCE: invention refers to the application of metal films to the surface of a conducting layer with a pattern created on a polymer substrate. The device for application of a metal film includes an anode, a polymer substrate with a surface, on which a conducting layer and a pattern playing the role of a cathode is created, a solid electrolyte membrane containing metal ions and located between the anode and the polymer substrate, moreover, the solid electrolyte membrane is in contact with the surface of the conducting layer with the pattern during formation of a metal film, a power unit, and an electrically-conducting component located in contact with the conducting layer with the pattern during formation of a metal film so that the negative electrode of the power unit is electrically connected to the conducting layer with the pattern, moreover, the electrically-conducting component is performed with the possibility of disconnection from the conducting layer with the pattern, whereupon, metal ions are restored for deposition of metal forming a metal film on the surface of the conducting layer with the pattern after delivery of electrical potential.

EFFECT: invention provides the possibility of formation of a metal film without formation of unnecessary conducting areas on the substrate.

8 cl, 10 dwg, 3 ex

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RU 2 615 009 C1

Authors

Hiraoka Motoki

Yanagimoto Hiroshi

Sato Yuki

Dates

2017-04-03Published

2015-12-23Filed