DEVICE AND METHOD FOR PLASMA SUBSTRATE COATING, IN PARTICULAR, TO PRESS LIST Russian patent published in 2017 - IPC C23C16/50 C23C16/52 B30B15/06 H01J37/32 

Abstract RU 2615743 C2

FIELD: electricity.

SUBSTANCE: device contains a vacuum chamber (3) and positioned therein electrode (400 … 409), which is segmented, wherein each of the electrode segments (500 … 512) has its own connecting output (6) for the source (700 … 702) of electric energy . The size of the electrode segment (500…512) selected to provide electrical energy inside the electrode segment (500…512), is not sufficient for electrical breakdown. When coating a substrate (2) is positioned on the opposite electrode (400 … 409) and include dedicated electrode segment (500 … 512) of the electrode (400 … 409) source (700 … 706) of energy. The gas, which is stimulated by the plasma chemical vapor deposition on a substrate (2), is added.

EFFECT: improving the quality of the coating.

25 cl, 12 dwg

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RU 2 615 743 C2

Authors

Gebeskhuber, Andreas

Khajm, Daniel

Lajmer, Jokhann

Myuller, Tomas

Proshek, Mikhael

Shtadler, Otto

Shteri, Kherbert

Dates

2017-04-11Published

2013-08-06Filed