PLANT FOR WASHING WAFERS Russian patent published in 2017 - IPC H01L21/306 B08B3/10 

FIELD: instrument making.

SUBSTANCE: invention relates to equipment for semiconductor devices production and can be used for degreasing and washing wafers. Plant enables successive washing wafers in organic solvent vapor and in liquid, providing closed cyclic process, characterized by high processability, since it does not require an operator, and high cost-effectiveness because one solvent loading is enough to degrease a large number of wafers.

EFFECT: technical result is decreased cost and labor intensiveness of washing due to the fact that the unit for washing of wafers is made in the form of a chamber, consisting of upper and lower compartments, connected by a nozzle, lower compartment of the chamber is designed for a solvent, and in the upper compartment there is a cassette with processed wafers, bottom of the upper compartment is inclined, in the lower point of the inclined bottom there is an inlet of the drawoff nozzle, outlet of which is arranged in the lower compartment of the chamber, and the upper part of the drawoff nozzle is located at the level of the upper wafers edge in the cassette, chamber is equipped with a nozzle-refrigerator located in the upper compartment, and a heating element placed under the lower compartment.

1 cl, 1 dwg