METHOD AND DEVICE TO WASH AND DRY SUBSTRATES Russian patent published in 2014 - IPC H01L21/306 

FIELD: electricity.

SUBSTANCE: in the method to wash and dry substrates, each substrate is installed on a carrier, submerged into a washing bath with de-ionised water until full submersion of the substrate, then slowly raised from water into the drying chamber, washing it with the help of megasound radiation, and at the moment of substrate removal from water, vapours of organic dissolvent are supplied to the interface of the bath and air medium of the chamber and dried. The novelty in the method is the fact that zones of point contacts with the carrier are created on the substrate carrier, the substrate is installed onto the carrier so that the lower end of the substrate is arranged at a certain angle to the horizontal line, the substrate is submerged into the washing bath continuously, and when the substrate is raised, megasound radiation is directed to the entire width of the substrate.

EFFECT: invention makes it possible to increase quality of washing and drying of substrates, to expand process capabilities of a device, to simplify equipment realisation of the treatment process and to increase reliability and efficiency of treatment.

2 cl, 9 dwg