FIELD: physics.
SUBSTANCE: present invention describes methods and apparatus for implementing a reduction process to approach a lens configuration, the previous DMU demonstration being modified for the next iteration. In preferred embodiments, the iterative cycle may be initiated during a reduction process in which one or more of various techniques, techniques, and methods for thickness correction can be implemented.
EFFECT: improved accuracy of manufactured products.
34 cl, 13 dwg, 7 tbl
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