METHOD OF APPLYING COATING FOR DEPLOYING LAYER SYSTEM ON SUBSTRATE AND SUBSTRATE WITH LAYER SYSTEM Russian patent published in 2017 - IPC C23C14/24 C23C14/35 

FIELD: technological processes.

SUBSTANCE: in an evacuated working chamber (2), having a cathodic arc source-evaporator (Q1) with evaporated material (M1) and a source (Q2) of magnetron discharge with material released under magnetron discharge (M2) that operates in high-power impulse magnetron sputtering (HIPIMS), at least one contact layer (S1), containing material to be evaporated (M1), is formed on the surface of substrate (1) by vacuum cathodic arc evaporation. At least one intermediate layer (S2) is formed on said contact layer (S1) as a nanostructured mixed layer, or as a layer of nanocomposite containing the material to be evaporated (M1) and discharged material (M2), by simultaneously reactive depositing of materials by vacuum cathodic arc source-evaporator (Q1) and source (Q2) of magnetron discharge. Next, at least one upper layer (S3) containing the material (M2) is formed by magnetron discharge source (Q2) operating in HIPIMS mode.

EFFECT: formation of multi-layer coating is provided which combines the advantages of both coating methods, namely vacuum cathodic arc evaporation and magnetron discharge process in HIPIMS mode, and has lower roughness than multilayer coating of essentially the same chemical composition, that is produced by methods known from prior art.

15 cl, 3 dwg, 1 tbl