FIELD: chemistry.
SUBSTANCE: method of producing a thin-film coating based on complex oxide systems involves the preparation of a film-forming solution in the presence of an additive with further application of this solution to the surface of a silicon substrate and the heat treatment. The heat treatment is carried out in an air atmosphere at 800°C for one hour, phosphoric acid, calcium chloride, and magnesium nitrate are used as an additive.
EFFECT: reducing the time of producing thin-film nanoporous coating.
2 ex
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF PRODUCING THIN-FILM MATERIALS BASED ON SILICON, PHOSPHORUS, CALCIUM AND MAGNESIUM OXIDES | 2019 |
|
RU2719580C1 |
| COMPOSITION BASED ON COMPLEX OXIDES OF ZIRCONIUM, PHOSPHORUS AND CALCIUM FOR COATING OBTAINING | 2012 |
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| METHOD OF OBTAINING MULTI-LAYERED COVERING | 2013 |
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| METHOD OF PRODUCING THIN-FILM COATING | 2015 |
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| CLARIFYING THIN-FILM COATING BASED ON SILICON(IV) AND BISMUTH(III) OXIDE COMPOUNDS | 2014 |
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| LIGHT-REDISTRIBUTING COATING | 2013 |
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| METHOD OF PRODUCING SILICON DIOXIDE-BASED THIN NANOSTRUCTURED SINGLE-LAYER COATINGS VIA SOL GEL METHOD IN PRESENCE OF INORGANIC ACIDS AND SALTS THEREOF | 2010 |
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| METHOD OF PRODUCING METAL HIGH-POROSITY NANO-SIZED COATING | 2011 |
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| METHOD OF PRODUCING HIGH-POROUS COATING ON BASIS OF DOUBLE SILICON AND NICKEL OXIDES | 2012 |
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RU2490074C1 |
