THIN FILM DEVICES AND THEIR MANUFACTURE Russian patent published in 2017 - IPC G02F1/155 

FIELD: physics.

SUBSTANCE: method includes: obtaining a substrate that contains the first conductive layer on its working surface; removing the first band of the first conductive layer on the substrate periphery and along between about 10% to about 90% of the substrate perimeter; depositing the said one or more layers of optical device materials and the second conductive layer so that they cover the first conductive layer and extend beyond the first conductive layer to the said first band on the substrate periphery; removing the second band, narrower than the first band, from all the layers along the entire substrate perimeter. The removal depth is, at least, sufficient to remove the first conductive layer; removing, at least, one region of the second transparent conductive layer, and also one or more layers of the optical device below it, to release, at least, one open region of the first conductive layer; and applying a tire to, at least, one open region of the first transparent conductive layer, wherein, at least, one of the first and the second conductive layers is transparent.

EFFECT: invention allows to provide insulation from the edge defects.

59 cl, 40 dwg