FIELD: manufacturing technology.
SUBSTANCE: provided is a polishing composition which can polish a sapphire substrate having non-polar plane or semi-polar plane at a high polishing rate. Invention provides a polishing composition used in an application to polish sapphire substrate having a non-polar plane or semi-polar plane, the polishing composition contains colloidal silica particles and water in which the value obtained by dividing the specific surface area (unit: m2/g) of the colloidal silica particles by a number-average particle diameter (unit: nm) of colloidal silica particles, that is, the specific surface area/number-average particle diameter is 0.5 or more and 3.0 or less.
EFFECT: polishing composition is represented with the help of which it is possible to polish the sapphire substrate.
7 cl, 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| POLISHING COMPOSITION | 2012 |
|
RU2591152C2 |
| LOT OF SAPPHIRE SUBSTRATES AND METHOD OF ITS PRODUCTION | 2007 |
|
RU2412037C1 |
| POLISHING COMPOSITION | 2012 |
|
RU2620836C2 |
| METHOD OF MACHINING SAPPHIRE SUBSTRATE | 2007 |
|
RU2422259C2 |
| POLISHING SLURRY FOR SAPPHIRE SUBSTRATES | 2017 |
|
RU2635132C1 |
| CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SAPPHIRE SURFACE AND METHODS OF USING SAME | 2014 |
|
RU2661219C2 |
| FLEXIBLE ABRASIVE TOOL AND METHOD OF FABRICATING ABRASIVE POWDER | 2008 |
|
RU2426635C2 |
| SAPPHIRE SUBSTRATE (VERSIONS) | 2007 |
|
RU2414550C1 |
| METHOD FOR MACHINING OF CYLINDRICAL SAPPHIRE PARTS, SAPPHIRE PLUNGER PAIR AND METERING PUMP BUILT THERE AROUND | 2012 |
|
RU2521129C1 |
| FIXED ABRASIVE ARTICLES INCORPORATING COATED ABRASIVE ARTICLES | 2009 |
|
RU2449880C1 |
