FIELD: chemistry.
SUBSTANCE: invention relates to methods for silylating substrates containing aromatic groups. Disclosed is a silylation process comprising bringing an organic substrate, containing an aromatic group, into contact with a mixture of at least one organosilane containing at least one silicon-hydrogen bond (Si-H), at least one silicon-carbon bond (Si-C) and optionally at least one silicon-oxygen bond (Si-O) or a silicon-nitrogen bond (Si-N); and at least one strong base including potassium alkoxide, cesium alkoxide, potassium hydride, calcium hydride and potassium bis (trimethylsilyl) amide, under conditions suitable for silylating the substrate to produce a silylated product.
EFFECT: technical result is that the disclosed method does not require the presence of transition metal compounds, ensuring its pharmaceutical applicability.
35 cl, 22 dwg, 4 tbl, 7 ex
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