FIELD: technological processes.
SUBSTANCE: invention relates to a method for plasma chemical treatment of liquid raw materials, as well as to a device for such treatment and can be used in food, bioenergy, chemical and petrochemical industries. Method includes an electrical effect on water-containing raw materials of products of low-temperature plasma. Electrical effect is performed with a parameter value E/N0=10-6–10-7 [V·cm2], where E is the electric field strength, N0 is the concentration of charged particles in the discharge gap. At the same time, the gas medium is moistened, providing a moisture content of 20 to 100 %. Hydrogen index of a raw material is maintained at a level from 2 to 7, the conductivity of the raw material is maintained in the interval S=10-2–104 Cm. Device for plasma chemical treatment of liquid raw materials contains a plasma-chemical reactor, system for supplying and withdrawing raw materials, gas supply system above the irradiated component, and a power source. Power source provides the formation of an electrical discharge with volumetric electronic and ionic charges in a continuous or pulsed mode. Gas supply system is provided with a device for humidifying the supplied gas with water vapor.
EFFECT: effective disinfection of raw materials, which is subject to long-term storage, and improvement of efficiency of electric power utilization.
4 cl, 2 dwg
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Authors
Dates
2018-08-29—Published
2017-06-26—Filed