FIELD: chemistry; spraying.
SUBSTANCE: invention relates to a method for vacuum ion-plasma deposition of a thin amorphous lithium phosphorus oxynitride (LiPON) film on the surface of steel substrates. Substrates are cleaned by ion sputtering, heating the crucible with lithium orthophosphate (Li3PO4) and evaporation of lithium orthophosphate (Li3PO4). Said heating of the crucible and evaporation of lithium orthophosphate is carried out using a combination of the main discharge in a mixture of nitrogen and lithium orthophosphate vapours (Li3PO4), formed between a hollow self-heated cathode placed in a vacuum chamber, through which nitrogen is supplied, and a crucible, and an auxiliary discharge formed between a directly heated thermionic cathode and a crucible placed in the vacuum chamber. Plasma of auxiliary discharge is separated from flow of lithium orthophosphate by screen. Ratio of currents of the main and auxiliary discharges is set in range of 0.7-1. Flap is opened. Thin amorphous film of lithium phosphorus oxynitride (LiPON) with ionic conductivity of more than 1.2⋅10-6 (Ohm⋅cm)-1 is deposited at a constant rate at a nitrogen pressure of 1 Pa and a temperature of not more than 300 °C on the surface of steel substrates.
EFFECT: obtaining thin films of phosphorus-oxynitride of lithium with evaporation of lithium orthophosphate under conditions of controlled degree of dissociation of vapours, which determines ionic conductivity of films.
1 cl, 3 dwg
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Authors
Dates
2024-12-09—Published
2023-12-22—Filed