METHOD FOR VACUUM-PLASMA DEPOSITION OF A THIN FILM OF LITHIUM PHOSPHORUS OXYNITRIDE Russian patent published in 2023 - IPC C23C14/16 C23C14/24 C23C14/56 

FIELD: vacuum ion-plasma production

SUBSTANCE: invention relates to a method for vacuum ion-plasma production of a thin amorphous film of lithium phosphorus oxynitride (LiPON) on the surface of steel substrates with a floating potential. A discharge is ignited between a self-heating hollow cathode and an annular anode, the surface of steel substrates is cleaned by ion sputtering with an increase in the discharge current to 10 A. The crucible with lithium orthophosphate (Li₃PO₄) placed in it is heated and lithium orthophosphate (Li₃PO₄) is evaporated using an auxiliary discharge between the in a vacuum chamber with a directly heated thermionic cathode and a crucible. The auxiliary discharge plasma is separated from the stream of lithium orthophosphate (Li₃PO₄) vapor by a screen. Then, nitrogen is supplied to the vacuum chamber through the self-heating hollow cathode, the discharge current is increased to 17.5 A between the self-heating hollow cathode and the annular anode. A thin amorphous film of lithium phosphorus oxynitride (LiPON) is deposited on the surface of steel substrates at a constant rate. In the vacuum chamber, the self-heating hollow cathode, the annular anode and the crucible are installed coaxially. The substrate holder with steel substrates is placed between the self-heating hollow cathode and the annular anode.

EFFECT: formation of an amorphous film of lithium phosphorus oxynitride (LiPON) on the surface of steel substrates is provided.

1 cl, 3 dwg