FIELD: technological processes.
SUBSTANCE: use to form microneedles. Essence of the invention lies in the fact that the method of manufacturing microneedles and an array of microneedles consists in applying on the upper surface of a single-crystal silicon substrate with orientation (100) of a protective film, forming a mask in it and the subsequent local anisotropic etching of silicon, while at the same time forming the mask between the mask and the peripheral region of the protective film that forms an outer frame during etching, and between adjacent masks in the manufacture of an array of microneedles form supporting elements – suspensions, for example, in the form of strips or sawtooth teeth, the supporting elements – suspensions are formed so that the direction of the longitudinal axis of the supporting elements – suspensions coincides with crystallographic direction <111>.
EFFECT: providing opportunities to improve the quality and fidelity of microneedles.
1 cl, 5 dwg
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Authors
Dates
2019-01-17—Published
2017-10-06—Filed