METHOD FOR MANUFACTURE OF MICRONEEDLE IN INTEGRAL VERSION WITH INTERNAL CHANNELS Russian patent published in 2019 - IPC A61M37/00 

FIELD: medicine; biotechnology.

SUBSTANCE: invention refers to medicine and biotechnology, particularly to devices for injections, namely microneedle created by technologies compatible with technologies of manufacturing integrated circuits. Method of making microneedle in integral version with internal channels consists in that, first, control elements for accurate positioning and accurate etching are formed on the first side of silicon plate. Then aluminum is applied from the second side of the plate and photoresist layer is applied from above. Then, deep plasma-chemical etching is performed, thus forming channels. Photoresist and aluminum layers are then removed. Protective film is formed on both sides of the plate. Then, on the first side of the silicon plate, at the same time as the mask is formed, support elements – suspensions, for example, in the form of bands or sawtooth teeth – are formed. Supporting elements – suspensions are formed so that direction of longitudinal axis of supporting elements – suspensions coincides with crystallographic direction <111>, then from the first side there performed is deep anisotropic etching and residues of protective film are removed.

EFFECT: reduction of microneedle sizes, creation of a simpler manufacturing technology, improvement of microneedle parameters (strength, smoothness, reproducibility of dimensions), reduced ratio between thickness of walls and diameter of channel and due to all this expansion of functional capabilities of microneedle.

1 cl, 5 dwg