FIELD: physics.
SUBSTANCE: invention relates to design and technology of making optoelectronic devices and specifically to photoelectric converters. The semiconductor photoconverter has a working surface on which radiation is incident, a base area made in form of a plate of p- or n-type semiconductor material and doped layers with high n+- and p+-conductivity, lying on two sides of the plate, contacts to said doped layers and antireflection coating on the working surface. On the surface of the base area free from n+- and p+ doped layers, there are micro-depressions, one, two or three linear dimensions of which are comparable to a quarter of the radiation wavelength, corresponding to maximum spectral density of the radiation. Parts of the base area between the micro-depressions have doped layers whose surface is covered with metal contacts. The width of the doped layers and contacts between the micro-depressions is equal to 5-10 nm. The micro-depressions have antireflecting coating with passivating properties with the following parameters: radiation absorption coefficient 0.94-0.99, rate of effective surface recombination of 1-20 cm/s. Disclosed also is a method of making said photoconverter.
EFFECT: invention provides high efficiency of converting intense radiation streams.
6 cl, 4 dwg,1 ex
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Authors
Dates
2011-01-27—Published
2009-04-01—Filed