FIELD: metallurgy.
SUBSTANCE: invention relates to a method of applying thin metal coatings on a substrate and can be used in vacuum metallurgy for applying metal protective or decorative coatings on articles. Method of applying thin metal coatings on substrate is carried out by magnetron or vacuum-arc method. First, substrate surface is treated with compression plasma flows. It is followed by multiple irradiation after sputtering in vacuum with high-current electron beams with parameters: duration of irradiation from 1 mcs to 100 mcs, density of invested energy from 5 J/cm2 up to 30 J/cm2.
EFFECT: technical result of the invention is to increase the adhesion of the film material to the substrate material when depositing thin films without increasing the film roughness.
1 cl, 1 ex
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Authors
Dates
2020-01-30—Published
2016-10-27—Filed