FIELD: radiation equipment.
SUBSTANCE: device for applying liquid medium loaded with ultraviolet radiation to substrate is disclosed. Device (1) comprises case (114, 14) with elongated chamber (122, 22), at least one inlet that expands in the direction of chamber (122, 22), and with at least one outlet (21) located opposite the inlet, having a shape of a slot, which extends over the length of chamber (122, 22). In the longitudinal direction, pipe segment (180, 30) passes through chamber (122, 22), which at least partially passes ultraviolet radiation. Flow space (184) is formed between pipe segment (180, 30) and chamber wall (122, 22), which is symmetrical relatively to a middle longitudinal plane of chamber (122, 22) dissecting outlet (21) in the center. Pipe segment (180, 30) passes into slot-shaped outlet (21) in case (114, 14) and forms two outlet slots (186, 37) that extend in the longitudinal direction between pipe segment (180, 30) and case (114, 14). At least one source of ultraviolet radiation is placed in pipe segment (180, 30), provided for emitting ultraviolet radiation in the direction of the flow space and through outlet (2) out of case (114, 14) to generate radicals in liquid and apply them to the surface of substrate (2). A means is placed in the pipe segment for adjusting the radiation exiting through outlet (21) through pipe segment (180, 30), at which the radiation intensity increases in the direction to the middle longitudinal planes of chamber (122, 22).
EFFECT: technical result is homogenization of the distribution of radicals in liquid deposited on the surface of substrate by adjusting the radiation intensity.
10 cl, 12 dwg
