DEVICE FOR APPLICATION OF LIQUID MEDIUM EXPOSED TO ULTRAVIOLET RADIATION ON SUBSTRATE Russian patent published in 2019 - IPC B08B3/10 G03F1/82 H01L21/02 B05B1/04 B08B7/00 B05B17/00 H01L21/67 

FIELD: technological processes.

SUBSTANCE: invention relates to a device for applying a liquid medium exposed to ultraviolet radiation on a substrate. Device comprises: casing having an elongated chamber, at least one inlet opening open to the chamber, and at least one slotted outlet, opposite the inlet, which extends along the length of the chamber. It also has a tubular element that passes through the chamber in the longitudinal direction, which is partially transparent to ultraviolet radiation. Tubular element is located in the chamber the way the flow space is formed between the tubular element and the wall of the chamber. This flow space is symmetric about the longitudinal center plane of the chamber. Longitudinal center plane cuts the outlet in its middle, and the tubular element extends into the slotted outlet in the casing and thus forms two longitudinally running outlet slots between the tubular element and the casing. There is also at least one source of ultraviolet radiation in the tubular element, which is configured to emit ultraviolet radiation in the direction of the space for flow and through the outlet beyond the limits of the casing. Device is characterized by a cross section of the flow space for the flow, decreasing from the area adjacent to at least one inlet, towards the outlet slots.

EFFECT: technical result is to ensure uniformity of flow in the flow space and more uniform penetration of ultraviolet radiation into the liquid can be achieved by reducing the cross section of the flow.

14 cl, 17 dwg