DEVICE FOR APPLICATION OF LIQUID MEDIUM EXPOSED TO ULTRAVIOLET RADIATION ON SUBSTRATE Russian patent published in 2019 - IPC B05B17/04 

FIELD: technological processes.

SUBSTANCE: device for applying a liquid medium subjected to ultraviolet irradiation on a substrate comprises a housing having an oblong chamber, at least one inlet opening that is open to the chamber. Device also comprises at least one slit outlet opening opposite to the inlet opening, that extends along the length of the chamber, and the tubular element, that extends in the longitudinal direction through the chamber. Tubular member is at least partially transparent to ultraviolet radiation. Tubular element is located in the chamber in such a way that a flow space is formed between the tubular element and the wall of the chamber. Flow space is symmetrical with respect to the longitudinal center plane of the chamber. Longitudinal center plane cuts through the outlet in its middle and in such a way that the tubular element extends into the slotted outlet in the casing and thereby forms two longitudinal passing slots between the tubular element and the casing. Besides the device contains at least one source of ultraviolet radiation in the tubular element, that is designed to emit ultraviolet radiation in the direction of the space for flow and through the outlet to the outside of the casing to create radicals in the liquid and deliver the radicals to the surface of the substrate. Device also contains a means of providing ultraviolet radiation emitted mainly in the first wavelength range through the first section of the tubular element into the flow space, and providing ultraviolet radiation emitted mainly in the second wavelength range through the second section of the tubular element through the outlet of the casing and, optionally, into the end region of the flow space adjacent to the outlet slots. First and second wavelength ranges are different, and for at least one of the sections a maximum of 20 %, preferably a maximum of 5 % of the radiated power emitted through the corresponding section, falls on another wavelength range.

EFFECT: invention relates to a device for applying a liquid medium exposed to ultraviolet radiation on a substrate in order to process the substrate, however, the liquid is applied locally in the area of the device on a part of the substrate area, and the liquid is exposed to ultraviolet radiation.

15 cl, 12 dwg