DEVICE FOR APPLICATION OF LIQUID MEDIUM EXPOSED TO ULTRAVIOLET RADIATION ON SUBSTRATE Russian patent published in 2019 - IPC H01L21/67 

FIELD: technological processes.

SUBSTANCE: invention relates to a device for applying a liquid medium exposed to ultraviolet radiation on a substrate. Aim of the invention is the expansion of the region with a uniform concentration of radicals on the surface of the substrate. Device comprises: casing having an elongated chamber, at least one inlet opening that is open to the chamber, and at least one slotted outlet opening opposite to the inlet opening, which extends along the length of the chamber, a tubular member that extends longitudinally through the chamber, wherein the tubular member is at least partially transparent to ultraviolet radiation, this tubular element is located in the chamber in such a way that a flow space is formed between the tubular element and the wall of the chamber, the flow space is symmetrical with respect to the longitudinal central plane of the chamber, the longitudinal central plane cuts through the outlet in its middle, and in such a way that the tubular element extends into the slotted opening in the casing and thus forms two longitudinally extending outlet slots between the tubular element and the casing, and at least one source of UV radiation in the tubular element, which is designed to emit ultraviolet radiation in the direction of the space for flow and through the outlet to the outside relative to the casing. Device is characterized by a means which serves to influence the radiation emitted by the at least one source of ultraviolet radiation and exiting the discharge opening, the way a substantially uniform spatial distribution of the radicals is formed on the surface of the substrate in an area below at least 50 % of the outlet.

EFFECT: technical result consists in forming a uniform distribution of radicals in the medium on the substrate surface.

11 cl, 12 dwg