FIELD: lithography.
SUBSTANCE: invention relates to lithographic templates. An active lithographic template is characterized by that it contains elements in the form of islands and windows, wherein elements in the form of islands are made with the possibility to perform micromechanical movement at distances from 1 nm to 500 mcm at the stage of template formation and/or at the stage of applying a layer/layers of target material through this template, wherein the specified movement occurs due to the relaxation of mechanical stresses in islands of the template, mechanical stresses, in turn, are caused by a physical and/or chemical reaction in substance of islands of the template, initiated by external physical and/or chemical influence.
EFFECT: invention provides an increase in the maximum allowable thickness of material applied through the template and an increase in the manufacturability of creating and using the template.
20 cl, 28 dwg
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