FIELD: physics.
SUBSTANCE: invention claims topological x-ray absorbing stencils made of metal with high atomic number, formed on both sides of carrier membrane of x-ray lithographic template in the form of symmetric structures of equal thickness, superimposed in space.
EFFECT: reduced nonflatness degree of work surface of x-ray lithographic template.
3 cl, 5 dwg
Title | Year | Author | Number |
---|---|---|---|
METHOD FOR MANUFACTURE OF LITOGRAPHIC MASK FOR LIGA-TECHNOLOGY | 2007 |
|
RU2350996C1 |
METHOD OF MAKING X-RAY LITHOGRAPHIC PATTERN | 2019 |
|
RU2704673C1 |
X-RAY LITHOGRAPHIC TEMPLATE AND METHOD FOR PRODUCTION THEREOF | 2010 |
|
RU2469369C2 |
LITHOGRAPHIC MASK FOR LIGA-TECHNOLOGY AND METHOD FOR ITS MANUFACTURE | 2007 |
|
RU2350995C2 |
METHOD OF MAKING A SILICON X-RAY IMAGE | 2019 |
|
RU2716858C1 |
METHOD OF MAKING LIGA TEMPLATE | 2010 |
|
RU2431881C1 |
METHOD OF MAKING LIGA TEMPLATE | 2010 |
|
RU2431882C1 |
METHOD OF SCREEN-X-RAY LITHOGRAPHY | 2007 |
|
RU2344453C1 |
X-RAY TEMPLATE AND METHOD FOR ITS MANUFACTURING | 2012 |
|
RU2488910C1 |
X-RAY MASK AND METHOD OF ITS FABRICATION | 2013 |
|
RU2546989C2 |
Authors
Dates
2008-11-20—Published
2007-03-27—Filed