FIELD: functional materials technology.
SUBSTANCE: invention relates to the field of technology of functional materials and devices for nanophotonics, optoelectronics and radiation converters with high thermal stability based on nanosized thin-film structures of oxides of rare earth elements. The method for producing an optical thin film coating of gadolinium oxide Gd2O3 on a quartz glass substrate by high-frequency reactive magnetron sputtering includes the following steps. A target for sputtering is preliminarily made from gadolinium metal powder with a particle size of 5 to 20 mcm by cold pressing at a pressing pressure of 10 to 50 MPa. A coating of gadolinium oxide is applied to the surface of said substrate for 5-6 hours at a magnetron discharge power of 100 to 200 W in an argon-oxygen medium with a total pressure of 0.15 Pa at an oxygen volume concentration of 25 to 35%. During application, the temperature of the substrate is maintained at 150-250°C. After applying said coating, the quartz glass substrate coated with gadolinium oxide in the form of a thin film is cooled in a vacuum chamber at a total pressure of not more than 10-3 Pa to room temperature.
EFFECT: increase in the degree of homogeneity and increase in the range of spectral transparency up to 5.5 eV of optical thin-film coatings based on gadolinium oxide Gd2O3 on a quartz glass substrate.
1 cl, 5 ex, 3 dwg
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Authors
Dates
2022-05-25—Published
2021-12-22—Filed