FIELD: chemistry and electronics.
SUBSTANCE: invention can be used in the manufacturing of solar cells, photodiodes, detectors, and optoelectronic devices. Cathode electrode in form of a transparent conductive coating is applied by the ion-beam method in presence of an oxidizing gas at a source voltage of 1000 V and a power of 200 W onto the front surface of a device structure based on halide perovskites containing an anode electrode, a p-type selective transport layer, a photoabsorbing layer, an n-type selective transport layer based on C60 organic semiconductors, and a hole-blocking layer placed in series on the substrate. The cathode electrode material is selected from In2O3:SnO2; Al2O3:ZnO, as well as metals - Ag, Ni or Cu.
EFFECT: invention enables obtaining a frontal transparent conductive electrode coating (TCEC) for optoelectronic devices based on halide perovskites with a high deposition rate of 10 nm/min, without the need to use buffer layers to protect against plasma exposure.
1 cl, 4 dwg, 1 tbl
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Authors
Dates
2023-06-09—Published
2022-10-03—Filed