FIELD: chemistry.
SUBSTANCE: invention relates to technology of thin films, in particular to method of forming uniform in thickness cerium oxide (CeO2) films on substrates of complex spatial configuration, and can be applied for creation of uniform in thickness cerium oxide films in solution of a number of problems of nanotechnology, energy-efficient technologies, in electronic, atomic and other fields of science and technology. Method includes magnetron spraying of metal target in operating chamber in atmosphere, which contains inert gas and oxygen, and precipitation of cerium oxide on substrate, with substrate being placed on anode in area of zone of active target spraying at the distance from target R exceeding depth of thermalisation zone L of sprayed atoms of target, with ratio R/L in the range 1.2÷1.5.
EFFECT: formation of uniform in thickness coatings of cerium oxide on substrates of complex spatial configuration.
2 dwg, 1 ex
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Authors
Dates
2015-01-27—Published
2013-10-18—Filed