METHOD FOR CREATING A NANOLAYER OF AMORPHOUS SILICON OF A PREDETERMINED THICKNESS WHEN WATERPROOFING A SUBSTRATE Russian patent published in 2022 - IPC G01B21/08 

FIELD: nano technology.

SUBSTANCE: proposed is a method for creating a nanolayer of amorphous silicon of a predetermined thickness when waterproofing a substrate, wherein the mass of silicon required to create a nanolayer of amorphous silicon of a predetermined thickness is calculated; the volume of silicon hydride required to create a nanolayer of amorphous silicon of a predetermined thickness is calculated; and the calculated volume of silicon hydride is input into the apparatus for creating a nanolayer of amorphous silicon, and the silicon hydride is converted into amorphous silicon, forming a nanolayer of amorphous silicon of a predetermined thickness on at least one surface of the substrate at a temperature from 300°C to 600°C, wherein the volume of silicon hydride is calculated based on the temperature and pressure in the apparatus for creating a nanolayer of amorphous silicon and/or the substrate at the time of supply of silicon hydride and/or a mixture of silicon hydride with an inert gas into the apparatus for creating a nanolayer of amorphous silicon and the calculated mass of silicon.

EFFECT: creation of a nanolayer of amorphous silicon of a predetermined thickness when waterproofing a substrate.

6 cl, 1 dwg