FIELD: scanning probe microscopy.
SUBSTANCE: invention relates to the field of scanning probe microscopy. A method for manufacturing aperture probes for near-field optical microscopy includes forming a through hole with an input aperture for optical radiation with a diameter of 1 to 35 mcm, forming a hollow conical tip of the probe in a cantilever beam by local ion-beam etching with a focused ion beam, forming a hollow conical tip of a probe with a height of 500 nm to 30 µm, taper angle from 10 to 110 degrees, by the method for ion-stimulated material deposition, and the diameter of the base of the cone is greater than the diameter of the entrance aperture.
EFFECT: invention provides detection of a near-field optical signal with maximum accuracy, intensity and resolution, and minimum losses, in combination with the possibility of obtaining surface relief images in the atomic force microscopy mode.
4 cl, 5 dwg
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