HIGH-BRIGHTNESS SOURCE BASED ON LASER PLASMA AND METHOD OF GENERATION AND COLLECTION OF RADIATION Russian patent published in 2022 - IPC G21K3/00 H05G2/00 H05H1/06 

FIELD: high-brightness radiation sources.

SUBSTANCE: invention relates to high-brightness radiation sources in the wavelength range from approximately 0.4 to 120 nm. The method includes forming a target in the form of a layer of molten metal under the action of centrifugal force. The target is rotated at a linear speed of at least 100 m/s. In this case, most of the droplet fraction of impurities and the linear velocity vector of the target in the interaction zone are directed on one side of the plane passing through the interaction zone and the axis of rotation of the target assembly. Simultaneously, the pulsed irradiation of the target and the collection of radiation from the plasma are carried out in such a way that the short-wave plasma radiation beam and the focused laser radiation beam are on the other side of the said plane. The source of short-wave radiation contains two coaxial blocks of ellipsoidal mirrors located in series along the path of the beam of short-wave plasma radiation. On the way of the beam of short-wave radiation to the optical collector, there are means for suppressing pollution.

EFFECT: increase in the average power and spectral range of the collected radiation in compact sources of soft X-ray, EUV and HCF radiation of high brightness.

17 cl, 3 dwg