FIELD: material processing.
SUBSTANCE: group of inventions relates to a device for application of anticorrosive coating to metal wire with plasma-pulse deposition, a method for application of anticorrosive coating, using the specified device, and to metal wire covered with anticorrosive coating. The specified device contains a plasma deposition chamber having sealed input and output channels made with the possibility of maintenance of reduced pressure inside the plasma deposition chamber, when metal wire passes through them, passing through the plasma deposition chamber. At least one plasma bundle generator is located in the plasma deposition chamber. A transport system is used for progressive pulling of metal wire through the plasma deposition chamber.
EFFECT: uniform layering of target material on a wire surface is provided.
11 cl, 2 dwg
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