METHOD FOR MAGNETRON SPUTTERING OF COATINGS ON A MOVING METAL WIRE Russian patent published in 2023 - IPC C23C14/35 

FIELD: ion-plasma modification.

SUBSTANCE: invention relates to the field of ion-plasma modification of the surface of materials and is a method for magnetron deposition of metal or composite (nitride, oxide) coatings on a moving metal wire in an inverted cylindrical magnetron sputtering system (MSS). Preliminary plasma cleaning of the wire, sputtering of the cathode material and its deposition on the prepared surface of the wire in an argon gas medium are carried out. Preliminary plasma cleaning, sputtering and deposition of the coating is carried out using one technological source in the form of MSS when one of the types of power supply is supplied to the small-sized MSS cathode - asymmetric bipolar or unipolar pulsed with a pulse repetition rate of up to 100 kHz. The size of the small cathode satisfies the following condition: the ratio of the cathode diameter to the wire diameter is 30-300. In a particular case of carrying out the invention, the deposition of oxide films is carried out in the mentioned MSS in a gaseous environment additionally containing oxygen. The deposition of nitride films is carried out in the mentioned MSS in a gaseous environment additionally containing nitrogen. For deposition of multilayer films, several of the mentioned MSSs with cathodes of the corresponding materials are used in series.

EFFECT: high-adhesion films with a dense structure are obtained with small irretrievable losses of the cathode material.

4 cl, 5 dwg, 2 ex